Jiye Yang 杨继业

Research Assistant,Engineer

yangjy1@shanghaitech.edu.cn       SIST Building 2-209

Jiye Yang has received the first B.S. degree from the Shanghai Institute of Technology in 2008, major in safety engineering (with honors). In Germany he has received language certificate for German (named DSH in Germany) in 2010 and earned his second B.S. degree and M.S. (an academic degree in Germany named Diplom-Ingenieur) from Dresden University of Technology in 2017, major in microelectronics (with honors). After Graduation since April 2018, he is with the School of Information Science and Technology, ShanghaiTech University as a Research Assistant and Engineer of Shanghaitech Microsystem & Advanced materiaLs Laboratory (SMALL). From 2015/04 to 2015/10, he studied with Institute Director Prof. Bartha in Institute of Semiconductor and Microsystems Technology for Project electrical characterization of Ta2O5, HfO2 and Al2O3 films grown by ALD through CV- and I-V measurements. From 2015/10 to 2016/10, he worked as Research Assistant with Dr. Gloess, department leader Dynamic Coatings in Precision Coatings Division, in Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, focusing on sputtering and PECVD for metallic nanoparticle and protective layer. From 2016/8 to 2017/05, he studied with Institute Director Prof. Bartha in Institute of Semiconductor and Microsystems Technology to investigate lead-tin and tin-silver flip chip bumps for application in 3D chip architecture.

Education
2010.10-2017.5 B.S. and M.S. (an academic degree in Germany named Diplom-Ingenieur) Dresden University of Technology (Germany)
  • Major: Microelectronics
2009.4-2010.10 language certificate for German (in Germany named Deutsche Sprachprüfung für den Hochschulzugang) Dresden University of Technology (Germany)
  • Major: German
2004.9-2008.7 B.S. Shanghai Institute of Technology (China)
  • Major: Safety engineering
 
Research and Work Experience
  • 2015/04-2015/10 project for student in Institute of Semiconductor and Microsystems Technology
  • Electrical characterization of Ta2O5, HfO2 and Al2O3 films grown by ALD through CV- and IV measurements
  • 2015/10-2016/10 as research assistant in Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP
  • Focusing on sputtering and PECVD for metallic nanoparticle and protective layer
  • 2016/8-2017/05 Master’s thesis in Institute of Semiconductor and Microsystems Technology
  • Investigating lead-tin and tin-silver flip chip bumps for application in 3D chip architecture
Awards & Activities
  • 2006 China Undergraduate Mathematical Contest in Modeling second prize
  • 2008 Outstanding Graduate in Shanghai
  • Scholarship for seven times
Publications